<?xml version="1.0" encoding="UTF-8"?>
<!DOCTYPE article PUBLIC "-//NLM//DTD JATS (Z39.96) Journal Publishing DTD v1.3 20210610//EN" "JATS-journalpublishing1-3.dtd">
<article article-type="research-article" dtd-version="1.3" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xml:lang="ru"><front><journal-meta><journal-id journal-id-type="publisher-id">zhps</journal-id><journal-title-group><journal-title xml:lang="ru">Журнал прикладной спектроскопии</journal-title><trans-title-group xml:lang="en"><trans-title>Zhurnal Prikladnoii Spektroskopii</trans-title></trans-title-group></journal-title-group><issn pub-type="ppub">0514-7506</issn><publisher><publisher-name>B. I. Stepanov Institute of Physics of the National Academy of Sciences</publisher-name></publisher></journal-meta><article-meta><article-id custom-type="elpub" pub-id-type="custom">zhps-1315</article-id><article-categories><subj-group subj-group-type="heading"><subject>Research Article</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="ru"><subject>СПЕКТРОСКОПИЯ ГАЗОВ И ПЛАЗМЫ</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="en"><subject>SPECTROSCOPY IN GAS AND PLASMA</subject></subj-group></article-categories><title-group><article-title>Изменение параметров плазмы и электрических характеристик барьерного разряда в процессе обработки гранулированных материалов</article-title><trans-title-group xml:lang="en"><trans-title>Investigation of Plasma Parameters and Electrical Characteristics of a Barrier Discharge During Plasma Treatment of Granular Materials</trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Люшкевич</surname><given-names>В. А.</given-names></name><name name-style="western" xml:lang="en"><surname>Lyushkevich</surname><given-names>V. A.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Минск</p></bio><bio xml:lang="en"><p>Minsk</p></bio><email xlink:type="simple">v.lyushkevich@ifanbel.bas-net.by</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Гончарик</surname><given-names>С. В.</given-names></name><name name-style="western" xml:lang="en"><surname>Goncharik</surname><given-names>S. V.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Минск</p></bio><bio xml:lang="en"><p>Minsk</p></bio><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Паращук</surname><given-names>В. В.</given-names></name><name name-style="western" xml:lang="en"><surname>Parashchuk</surname><given-names>V. V.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Минск</p></bio><bio xml:lang="en"><p>Minsk</p></bio><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Филатова</surname><given-names>И. И.</given-names></name><name name-style="western" xml:lang="en"><surname>Filatova</surname><given-names>I. I.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Минск</p></bio><bio xml:lang="en"><p>Minsk</p></bio><xref ref-type="aff" rid="aff-1"/></contrib></contrib-group><aff-alternatives id="aff-1"><aff xml:lang="ru"><institution>Институт физики НАН Беларуси</institution></aff><aff xml:lang="en"><institution>B.I. Stepanov Institute of Physics of the National Academy of Sciences of Belarus</institution></aff></aff-alternatives><pub-date pub-type="collection"><year>2023</year></pub-date><pub-date pub-type="epub"><day>31</day><month>05</month><year>2023</year></pub-date><volume>90</volume><issue>3</issue><fpage>487</fpage><lpage>496</lpage><permissions><copyright-statement>Copyright &amp;#x00A9; Люшкевич В.А., Гончарик С.В., Паращук В.В., Филатова И.И., 2023</copyright-statement><copyright-year>2023</copyright-year><copyright-holder xml:lang="ru">Люшкевич В.А., Гончарик С.В., Паращук В.В., Филатова И.И.</copyright-holder><copyright-holder xml:lang="en">Lyushkevich V.A., Goncharik S.V., Parashchuk V.V., Filatova I.I.</copyright-holder><license xml:lang="ru" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>Данная работа распространяется под лицензией Creative Commons Attribution 4.0.</license-p></license><license xml:lang="en" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>This work is licensed under a Creative Commons Attribution 4.0 License.</license-p></license></permissions><self-uri xlink:href="https://zhps.ejournal.by/jour/article/view/1315">https://zhps.ejournal.by/jour/article/view/1315</self-uri><abstract><p>Изучено влияние свойств обработанных плазмой диэлектрического барьерного разряда (ДБР) гранулированных материалов (катализатора ZnO, морской соли NaCl) и семян растений на режимы горения и мощность разряда. Методами оптической эмиссионной спектроскопии исследована пространственная структура ДБР. Из анализа распределения интенсивности в неразрешенных по вращательной структуре полосах (2+) N2 и (1-) N2+ определены усредненные по поперечному сечению разрядного промежутка электронная, колебательная и вращательная температуры плазмы. В присутствии обрабатываемых материалов имеет место переход от филаментарного режима горения ДБР к комбинации филаментарного и поверхностного разрядов, что сопровождается увеличением потребляемой электрической мощности и колебательной температуры плазмы в приэлектродной области в окрестности наполнителя.</p></abstract><trans-abstract xml:lang="en"><p>The effect of the properties of granular materials (catalyst ZnO, sea salt NaCl) and plant seeds during their treatment in plasma of dielectric barrier discharge (DBD) on the combustion mode and discharge power was investigated. Optical emission spectroscopy methods were used to investigate the discharge spatial structure. Electron, vibrational, and rotational temperatures of plasma averaged over the cross section of the discharge gap were determined from the analysis of intensity distribution in rotationally unresolved spectral bands of (2+) N2 and (1-) N2+. It was observed a transition from the DBD filamentary mode to the combination of filamentary and surface discharges when the treated materials were presented in the discharge that was accompanied by an increase in the power dissipated in the discharge and the vibrational temperature in the near-electrode region in the vicinity of the material.</p></trans-abstract><kwd-group xml:lang="ru"><kwd>низкотемпературная плазма</kwd><kwd>диэлектрический барьерный разряд</kwd><kwd>оптическая эмиссионная спектроскопия</kwd><kwd>плазменная обработка</kwd><kwd>катализатор</kwd><kwd>семена растений</kwd></kwd-group><kwd-group xml:lang="en"><kwd>low temperature plasma</kwd><kwd>dielectric barrier discharge</kwd><kwd>optical emission spectroscopy</kwd><kwd>plasma treatment</kwd><kwd>catalyst</kwd><kwd>plant seeds</kwd></kwd-group><funding-group><funding-statement xml:lang="ru">Авторы выражают благодарность В.В. Ажаронку за полезные обсуждения и ценные рекомендации. Работа выполнена при частичной финансовой поддержке Белорусского республиканского фонда фундаментальных исследований (грант № Ф21МС-016), а также в рамках задания 2.2.02 ГПНИ “Конвергенция-2025” на 2021—2025 гг. (НИР 1 “Разработка основ комбинированного воздействия плазмы, электромагнитных полей и бихроматического лазерного излучения на материалы и биологические объекты для использования в новых технологиях”).</funding-statement></funding-group></article-meta></front><back><ref-list><title>References</title><ref id="cit1"><label>1</label><citation-alternatives><mixed-citation xml:lang="ru">C. Z. Liu, N. Y. Cui, N. M. Brown. Surface and Coating Technol., 185 (2004) 311e320</mixed-citation><mixed-citation xml:lang="en">C. Z. Liu, N. Y. Cui, N. M. Brown. Surface and Coating Technol., 185 (2004) 311e320</mixed-citation></citation-alternatives></ref><ref id="cit2"><label>2</label><citation-alternatives><mixed-citation xml:lang="ru">H.-E. Wagner, R. Brandenburg, K. V. Kozlov, A. Sonnenfeld, P. Michel, J. F. Behnke. Vacuum, 71, N 3 (2003) 417—436</mixed-citation><mixed-citation xml:lang="en">H.-E. Wagner, R. Brandenburg, K. V. Kozlov, A. Sonnenfeld, P. Michel, J. F. Behnke. Vacuum, 71, N 3 (2003) 417—436</mixed-citation></citation-alternatives></ref><ref id="cit3"><label>3</label><citation-alternatives><mixed-citation xml:lang="ru">M. M. M. Bilek, M. Vandrovcova, A. Shelemin, A. Kuzminova, O. Kylian, H. Biederman, L. Bacakova, A. S. Weiss. Appl. Surface Sci., 518 (2020) 146128</mixed-citation><mixed-citation xml:lang="en">M. M. M. Bilek, M. Vandrovcova, A. Shelemin, A. Kuzminova, O. Kylian, H. Biederman, L. Bacakova, A. S. Weiss. Appl. Surface Sci., 518 (2020) 146128</mixed-citation></citation-alternatives></ref><ref id="cit4"><label>4</label><citation-alternatives><mixed-citation xml:lang="ru">K. Zdunek. Surface and Coatings Technol., 201 (2007) 4813—4816</mixed-citation><mixed-citation xml:lang="en">K. Zdunek. Surface and Coatings Technol., 201 (2007) 4813—4816</mixed-citation></citation-alternatives></ref><ref id="cit5"><label>5</label><citation-alternatives><mixed-citation xml:lang="ru">Y.-R. Zhang, K. Van Laer, E. C. Neyts, A. Bogaerts. Appl. Catal. B: Environ., 185 (2016) 56—67</mixed-citation><mixed-citation xml:lang="en">Y.-R. Zhang, K. Van Laer, E. C. Neyts, A. Bogaerts. Appl. Catal. B: Environ., 185 (2016) 56—67</mixed-citation></citation-alternatives></ref><ref id="cit6"><label>6</label><citation-alternatives><mixed-citation xml:lang="ru">M. Ansari, M. Sharifian, M. H. Ehrampoush, A. H. Mahvi, M. H. Salmani, H. Fallahzadeh. Chemosphere, 263 (2021) 128065</mixed-citation><mixed-citation xml:lang="en">M. Ansari, M. Sharifian, M. H. Ehrampoush, A. H. Mahvi, M. H. Salmani, H. Fallahzadeh. Chem-osphere, 263 (2021) 128065</mixed-citation></citation-alternatives></ref><ref id="cit7"><label>7</label><citation-alternatives><mixed-citation xml:lang="ru">J. Li, C. Ma, S. Zhu, F.Yu, B. Dai, D. Yang. Nanomaterials, 9, N 3-4 (2019) 11428—11462</mixed-citation><mixed-citation xml:lang="en">J. Li, C. Ma, S. Zhu, F.Yu, B. Dai, D. Yang. Nanomaterials, 9, N 3-4 (2019) 11428—11462</mixed-citation></citation-alternatives></ref><ref id="cit8"><label>8</label><citation-alternatives><mixed-citation xml:lang="ru">K. Ollegott, P. Wirth, C. Oberste-Beulmann, P. Awakowic, M. Muhler. Chem. Ing. Tech., 92, N 10 (2020) 1542—1558</mixed-citation><mixed-citation xml:lang="en">K. Ollegott, P. Wirth, C. Oberste-Beulmann, P. Awakowic, M. Muhler. Chem. Ing. Tech., 92, N 10 (2020) 1542—1558</mixed-citation></citation-alternatives></ref><ref id="cit9"><label>9</label><citation-alternatives><mixed-citation xml:lang="ru">S. H. Liu, M. Neiger. J. Phys. D: Appl. Phys., 34 (2001) 1632—1638</mixed-citation><mixed-citation xml:lang="en">S. H. Liu, M. Neiger. J. Phys. D: Appl. Phys., 34 (2001) 1632—1638</mixed-citation></citation-alternatives></ref><ref id="cit10"><label>10</label><citation-alternatives><mixed-citation xml:lang="ru">E. Wagenaars, R. Brandenburg, W. J. M. Brok, M. D. Bowden, H.-E. Wagner. J. Phys. D: Appl. Phys., 39, N 4 (2006) 700—711</mixed-citation><mixed-citation xml:lang="en">E. Wagenaars, R. Brandenburg, W. J. M. Brok, M. D. Bowden, H.-E. Wagner. J. Phys. D: Appl. Phys., 39, N 4 (2006) 700—711</mixed-citation></citation-alternatives></ref><ref id="cit11"><label>11</label><citation-alternatives><mixed-citation xml:lang="ru">I. H. Bang, E. S. Lee, H. S. Lee, S. C. Min. Postharvest Biol. Technol., 162 (2020) 111102</mixed-citation><mixed-citation xml:lang="en">I. H. Bang, E. S. Lee, H. S. Lee, S. C. Min. Postharvest Biol. Technol., 162 (2020) 111102</mixed-citation></citation-alternatives></ref><ref id="cit12"><label>12</label><citation-alternatives><mixed-citation xml:lang="ru">K. Puprasit, D. Wongsawaeng, K. Ngaosuwan, W. Kiatkittipong, S. Assabumrungrat. Innovative Food Sci. Emerging Technol., 66 (2020) 102511</mixed-citation><mixed-citation xml:lang="en">K. Puprasit, D. Wongsawaeng, K. Ngaosuwan, W. Kiatkittipong, S. Assabumrungrat. Innovative Food Sci. Emerging Technol., 66 (2020) 102511</mixed-citation></citation-alternatives></ref><ref id="cit13"><label>13</label><citation-alternatives><mixed-citation xml:lang="ru">N. Wannicke, R. Wagner, J. Stachowiak, T. M. C. Nishime, J. Ehlbeck, K. Weltmann, H. Brust. Plasma Process Polym., 18 (2021) e2000207</mixed-citation><mixed-citation xml:lang="en">N. Wannicke, R. Wagner, J. Stachowiak, T. M. C. Nishime, J. Ehlbeck, K. Weltmann, H. Brust. Plasma Process Polym., 18 (2021) e2000207</mixed-citation></citation-alternatives></ref><ref id="cit14"><label>14</label><citation-alternatives><mixed-citation xml:lang="ru">S. Chaple, C. Sarangapani, J. Jones, E. Carey, L. Causeret, A. Genson, B. Duffy, P. Bourke. Innovative Food Sci. Emerging Technol., 66 (2020) 102529</mixed-citation><mixed-citation xml:lang="en">S. Chaple, C. Sarangapani, J. Jones, E. Carey, L. Causeret, A. Genson, B. Duffy, P. Bourke. Innovative Food Sci. Emerging Technol., 66 (2020) 102529</mixed-citation></citation-alternatives></ref><ref id="cit15"><label>15</label><citation-alternatives><mixed-citation xml:lang="ru">Y. Lee, Y. Y. Lee, Y. S. Kim, K. Balaraju, Y. S. Mok, S. J.Yoo, Y. Jeon. J. Ginseng Res., 45, N 4 (2021) 519—526</mixed-citation><mixed-citation xml:lang="en">Y. Lee, Y. Y. Lee, Y. S. Kim, K. Balaraju, Y. S. Mok, S. J.Yoo, Y. Jeon. J. Ginseng Res., 45, N 4 (2021) 519—526</mixed-citation></citation-alternatives></ref><ref id="cit16"><label>16</label><citation-alternatives><mixed-citation xml:lang="ru">V. Sirgedaite-Seziene, V. Mildaziene, P. Zemaitis, A. Ivankov, K. Koga, M. Shiratani, V. Baliuckas. Plasma Process Polym., 18 (2020) e2000159</mixed-citation><mixed-citation xml:lang="en">V. Sirgedaite-Seziene, V. Mildaziene, P. Zemaitis, A. Ivankov, K. Koga, M. Shiratani, V. Baliuckas. Plasma Process Polym., 18 (2020) e2000159</mixed-citation></citation-alternatives></ref><ref id="cit17"><label>17</label><citation-alternatives><mixed-citation xml:lang="ru">M. Kuchenbecker, N. Bibinov, A. Kaemlimg, D. Wandke, P. Awakowicz, W. Viol. J. Phys. D: Appl. Phys., 42 (2009) 045212</mixed-citation><mixed-citation xml:lang="en">M. Kuchenbecker, N. Bibinov, A. Kaemlimg, D. Wandke, P. Awakowicz, W. Viol. J. Phys. D: Appl. Phys., 42 (2009) 045212</mixed-citation></citation-alternatives></ref><ref id="cit18"><label>18</label><citation-alternatives><mixed-citation xml:lang="ru">T. Tanino, M. Matsui, K. Uehara, T. Ohshima. Food Control, 109 (2020) 106890</mixed-citation><mixed-citation xml:lang="en">T. Tanino, M. Matsui, K. Uehara, T. Ohshima. Food Control, 109 (2020) 106890</mixed-citation></citation-alternatives></ref><ref id="cit19"><label>19</label><citation-alternatives><mixed-citation xml:lang="ru">C. Zhang, T. Shao, K. Long, Y. Yu, J. Wang, D. Zhang, P. Yan, Y. Zhou. IEEE Transact. Plasma Sci., 38, N 6 (2010) 1517—1526</mixed-citation><mixed-citation xml:lang="en">C. Zhang, T. Shao, K. Long, Y. Yu, J. Wang, D. Zhang, P. Yan, Y. Zhou. IEEE Transact. Plasma Sci., 38, N 6 (2010) 1517—1526</mixed-citation></citation-alternatives></ref><ref id="cit20"><label>20</label><citation-alternatives><mixed-citation xml:lang="ru">M. Govaert, C. Smet, L. Vergauwen, B. Ecimovic, J. L. Walsh, M. Baka, J. V. Impe. Innovative Food Sci. Emerging Technol., 52 (2019) 376—386</mixed-citation><mixed-citation xml:lang="en">M. Govaert, C. Smet, L. Vergauwen, B. Ecimovic, J. L. Walsh, M. Baka, J. V. Impe. Innovative Food Sci. Emerging Technol., 52 (2019) 376—386</mixed-citation></citation-alternatives></ref><ref id="cit21"><label>21</label><citation-alternatives><mixed-citation xml:lang="ru">A. Ozkan, T. Dufour, A. Bogaerts, F Reniers. Plasma Sources Sci. Technol., 25, N 4 (2016) 045016</mixed-citation><mixed-citation xml:lang="en">A. Ozkan, T. Dufour, A. Bogaerts, F Reniers. Plasma Sources Sci. Technol., 25, N 4 (2016) 045016</mixed-citation></citation-alternatives></ref><ref id="cit22"><label>22</label><citation-alternatives><mixed-citation xml:lang="ru">T. Butterworth, R. W. K. Allen. Plasma Sources Sci. Technol., 26 (2017) 065008</mixed-citation><mixed-citation xml:lang="en">T. Butterworth, R. W. K. Allen. Plasma Sources Sci. Technol., 26 (2017) 065008</mixed-citation></citation-alternatives></ref><ref id="cit23"><label>23</label><citation-alternatives><mixed-citation xml:lang="ru">K. Van Laer, A. Bogaerts. Energy Technol., 3 (2015) 1038—1044</mixed-citation><mixed-citation xml:lang="en">K. Van Laer, A. Bogaerts. Energy Technol., 3 (2015) 1038—1044</mixed-citation></citation-alternatives></ref><ref id="cit24"><label>24</label><citation-alternatives><mixed-citation xml:lang="ru">H. Luo, K. Liu, J. Ran, Y. Yue, X. Wang, S. Yap, C. S. Wong. IEEE Transact. Plasma Sci., 42, N 5 (2014) 1211—1215</mixed-citation><mixed-citation xml:lang="en">H. Luo, K. Liu, J. Ran, Y. Yue, X. Wang, S. Yap, C. S. Wong. IEEE Transact. Plasma Sci., 42, N 5 (2014) 1211—1215</mixed-citation></citation-alternatives></ref><ref id="cit25"><label>25</label><citation-alternatives><mixed-citation xml:lang="ru">Е. В. Барабанова, К. М. Заборовский, Е. М. Посадова, Р. А. Кастро. Изв. Рос. гос. пед. ун-та им. А. И. Герцена, 157 (2013) 79—83</mixed-citation><mixed-citation xml:lang="en">Е. В. Барабанова, К. М. Заборовский, Е. М. Посадова, Р. А. Кастро. Изв. Рос. гос. пед. ун-та им. А. И. Герцена, 157 (2013) 79—83</mixed-citation></citation-alternatives></ref><ref id="cit26"><label>26</label><citation-alternatives><mixed-citation xml:lang="ru">S. K. P. Veerapandian, C. Leys, N. De Geyter, R. Morent. Catalysts, 7 (2017) 113</mixed-citation><mixed-citation xml:lang="en">S. K. P. Veerapandian, C. Leys, N. De Geyter, R. Morent. Catalysts, 7 (2017) 113</mixed-citation></citation-alternatives></ref><ref id="cit27"><label>27</label><citation-alternatives><mixed-citation xml:lang="ru">A. Bogaerts, Q. Zhang, Y. Zhang, K. V. Laer, W. Wang. Catalysis Today, 337 (2019) 3—14</mixed-citation><mixed-citation xml:lang="en">A. Bogaerts, Q. Zhang, Y. Zhang, K. V. Laer, W. Wang. Catalysis Today, 337 (2019) 3—14</mixed-citation></citation-alternatives></ref><ref id="cit28"><label>28</label><citation-alternatives><mixed-citation xml:lang="ru">K. Takaki, J.-S. Chang, K. G. Kostov. IEEE Trans. Dielectr. Electr. Insul., 11, N 3 (2004) 281—290</mixed-citation><mixed-citation xml:lang="en">K. Takaki, J.-S. Chang, K. G. Kostov. IEEE Trans. Dielectr. Electr. Insul., 11, N 3 (2004) 281—290</mixed-citation></citation-alternatives></ref><ref id="cit29"><label>29</label><citation-alternatives><mixed-citation xml:lang="ru">F. Judee, T. Dufour. J. Appl. Phys., 128 (2020) 044901</mixed-citation><mixed-citation xml:lang="en">F. Judee, T. Dufour. J. Appl. Phys., 128 (2020) 044901</mixed-citation></citation-alternatives></ref><ref id="cit30"><label>30</label><citation-alternatives><mixed-citation xml:lang="ru">N. A. Savastenko, I. I. Filatova, V. A. Lyushkevich, N. I. Chubrik, S. V. Goncharik, S. A. Maskevich. High Temp. Mater. Proc., 21, N 2 (2017) 127—142</mixed-citation><mixed-citation xml:lang="en">N. A. Savastenko, I. I. Filatova, V. A. Lyushkevich, N. I. Chubrik, S. V. Goncharik, S. A. Maskevich. High Temp. Mater. Proc., 21, N 2 (2017) 127—142</mixed-citation></citation-alternatives></ref><ref id="cit31"><label>31</label><citation-alternatives><mixed-citation xml:lang="ru">I. I. Filatova, V. A. Lyushkevich, S. V. Goncharik, N. I. Chubrik, A. G. Zhukovsky, N. A. Krupenko, N. G. Poplavskaya, Najeeb-ur-Rehman. IX Int. Conf. Plasma Physics and Plasma Technology (PPPT-9), September 17—21, 2018, Minsk, Kovcheg (2018) 437—440</mixed-citation><mixed-citation xml:lang="en">I. I. Filatova, V. A. Lyushkevich, S. V. Goncharik, N. I. Chubrik, A. G. Zhukovsky, N. A. Krupenko, N. G. Poplavskaya, Najeeb-ur-Rehman. IX Int. Conf. Plasma Physics and Plasma Technology (PPPT-9), September 17—21, 2018, Minsk, Kovcheg (2018) 437—440</mixed-citation></citation-alternatives></ref><ref id="cit32"><label>32</label><citation-alternatives><mixed-citation xml:lang="ru">Д. А. Сорокин, М. И. Ломаев, Т. И. Банокина, В. Ф. Тарасенко. ЖТФ, 84, № 8 (2014) 13—20</mixed-citation><mixed-citation xml:lang="en">Д. А. Сорокин, М. И. Ломаев, Т. И. Банокина, В. Ф. Тарасенко. ЖТФ, 84, № 8 (2014) 13—20</mixed-citation></citation-alternatives></ref><ref id="cit33"><label>33</label><citation-alternatives><mixed-citation xml:lang="ru">N. Britun, M. Gaillard, A. Ricard, Y. M. Kim, J. G. Han. J. Phys. D: Appl. Phys., 40, N 4 (2007) 1022—1029</mixed-citation><mixed-citation xml:lang="en">N. Britun, M. Gaillard, A. Ricard, Y. M. Kim, J. G. Han. J. Phys. D: Appl. Phys., 40, N 4 (2007) 1022—1029</mixed-citation></citation-alternatives></ref><ref id="cit34"><label>34</label><citation-alternatives><mixed-citation xml:lang="ru">http://www.specair-radiation.net</mixed-citation><mixed-citation xml:lang="en">http://www.specair-radiation.net</mixed-citation></citation-alternatives></ref><ref id="cit35"><label>35</label><citation-alternatives><mixed-citation xml:lang="ru">В. В. Ажаронок, И. И. Филатова, В. Д. Шиманович, Л. Н. Орлов. Журн. прикл. спектр., 68, № 5 (2001) 634—638</mixed-citation><mixed-citation xml:lang="en">V. V. Azharonok, I. I. Filatova, V. D. Shimanovich, L. N. Orlov. J. Appl. Spectr., 68 (2001) 831—837</mixed-citation></citation-alternatives></ref><ref id="cit36"><label>36</label><citation-alternatives><mixed-citation xml:lang="ru">F. J. J. Peeters, T. Butterworth. Atmospheric Pressure Plasma - From Diagnostics to Applications. In Tech. Open. (2019) 144</mixed-citation><mixed-citation xml:lang="en">F. J. J. Peeters, T. Butterworth. Atmospheric Pressure Plasma - From Diagnostics to Applications. In Tech. Open. (2019) 144</mixed-citation></citation-alternatives></ref><ref id="cit37"><label>37</label><citation-alternatives><mixed-citation xml:lang="ru">J. Kriegseis, B. Moller, S. Grundmann, C. Trope. J. Electrostatics, 69, N 4 (2011) 302—312</mixed-citation><mixed-citation xml:lang="en">J. Kriegseis, B. Moller, S. Grundmann, C. Trope. J. Electrostatics, 69, N 4 (2011) 302—312</mixed-citation></citation-alternatives></ref><ref id="cit38"><label>38</label><citation-alternatives><mixed-citation xml:lang="ru">D. Mei, X. Zhu, Y. He, J. D. Yan, X. Tu. Plasma Sources Sci. Technol., 24, N 1 (2015) 015011</mixed-citation><mixed-citation xml:lang="en">D. Mei, X. Zhu, Y. He, J. D. Yan, X. Tu. Plasma Sources Sci. Technol., 24, N 1 (2015) 015011</mixed-citation></citation-alternatives></ref><ref id="cit39"><label>39</label><citation-alternatives><mixed-citation xml:lang="ru">X. Tu, H.J. Gallon, J. C. Whitehead. J. Phys. D: Appl. Phys., 44 (2011) 482003</mixed-citation><mixed-citation xml:lang="en">X. Tu, H.J. Gallon, J. C. Whitehead. J. Phys. D: Appl. Phys., 44 (2011) 482003</mixed-citation></citation-alternatives></ref><ref id="cit40"><label>40</label><citation-alternatives><mixed-citation xml:lang="ru">Z. Ye, S. K. P. Veerapandian, I. Onyshchenko, A. Nikiforov, N. De Geyter, J. Giraudon, J. Lamonier, R. Morent. Ind. Eng. Chem. Res., 56, N 37 (2017) 10215—10226</mixed-citation><mixed-citation xml:lang="en">Z. Ye, S. K. P. Veerapandian, I. Onyshchenko, A. Nikiforov, N. De Geyter, J. Giraudon, J. Lamonier, R. Morent. Ind. Eng. Chem. Res., 56, N 37 (2017) 10215—10226</mixed-citation></citation-alternatives></ref><ref id="cit41"><label>41</label><citation-alternatives><mixed-citation xml:lang="ru">J. Cecha, P. Stahel, Z. Navratil. Eur. Phys. J. D, 54 (2009) 259—264</mixed-citation><mixed-citation xml:lang="en">J. Cecha, P. Stahel, Z. Navratil. Eur. Phys. J. D, 54 (2009) 259—264</mixed-citation></citation-alternatives></ref><ref id="cit42"><label>42</label><citation-alternatives><mixed-citation xml:lang="ru">N. Jidenko, E. Bourgeois, J.-P. Borra. J. Phys. D: Appl. Phys., 43 (2010) 295203</mixed-citation><mixed-citation xml:lang="en">N. Jidenko, E. Bourgeois, J.-P. Borra. J. Phys. D: Appl. Phys., 43 (2010) 295203</mixed-citation></citation-alternatives></ref><ref id="cit43"><label>43</label><citation-alternatives><mixed-citation xml:lang="ru">J. Li, S. Zhu, K. Lu, C. Ma, D. Yang, F. Yu. J. Environ. Chem. Eng., 9, N 1 (2020) 104654</mixed-citation><mixed-citation xml:lang="en">J. Li, S. Zhu, K. Lu, C. Ma, D. Yang, F. Yu. J. Environ. Chem. Eng., 9, N 1 (2020) 104654</mixed-citation></citation-alternatives></ref><ref id="cit44"><label>44</label><citation-alternatives><mixed-citation xml:lang="ru">K. Takaki, Y. Hatanaka, K. Arima, S. Mukaigawa, T. Fujiwara. Vacuum, 83 (2009) 128—132</mixed-citation><mixed-citation xml:lang="en">K. Takaki, Y. Hatanaka, K. Arima, S. Mukaigawa, T. Fujiwara. Vacuum, 83 (2009) 128—132</mixed-citation></citation-alternatives></ref><ref id="cit45"><label>45</label><citation-alternatives><mixed-citation xml:lang="ru">Р. А. Булгаков, Н. Н. Барышева. Ползуновский альманах, № 4 (2018) 205—207</mixed-citation><mixed-citation xml:lang="en">Р. А. Булгаков, Н. Н. Барышева. Ползуновский альманах, № 4 (2018) 205—207</mixed-citation></citation-alternatives></ref></ref-list><fn-group><fn fn-type="conflict"><p>The authors declare that there are no conflicts of interest present.</p></fn></fn-group></back></article>
