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<article article-type="research-article" dtd-version="1.3" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xml:lang="ru"><front><journal-meta><journal-id journal-id-type="publisher-id">zhps</journal-id><journal-title-group><journal-title xml:lang="ru">Журнал прикладной спектроскопии</journal-title><trans-title-group xml:lang="en"><trans-title>Zhurnal Prikladnoii Spektroskopii</trans-title></trans-title-group></journal-title-group><issn pub-type="ppub">0514-7506</issn><publisher><publisher-name>B. I. Stepanov Institute of Physics of the National Academy of Sciences</publisher-name></publisher></journal-meta><article-meta><article-id custom-type="elpub" pub-id-type="custom">zhps-1352</article-id><article-categories><subj-group subj-group-type="heading"><subject>Research Article</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="ru"><subject>СПЕКТРОСКОПИЯ НАНОСТРУКТУР</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="en"><subject>SPECTROSCOPY OF NANOSTRUCTURE</subject></subj-group></article-categories><title-group><article-title>Исследование методом спектроскопии комбинационного рассеяния света концентрации носителей заряда и механических напряжений в графене, перенесенном с помощью различных каркасов</article-title><trans-title-group xml:lang="en"><trans-title>Raman Spectroscopy Study of the Charge Carrier Concentration and Mechanical Stresses in Graphene Transferred Employing Different Frames</trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Дронина</surname><given-names>Е. А.</given-names></name><name name-style="western" xml:lang="en"><surname>Dronina</surname><given-names>E. A.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Минск</p></bio><bio xml:lang="en"><p>Minsk</p></bio><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Михалик</surname><given-names>М. М.</given-names></name><name name-style="western" xml:lang="en"><surname>Mikhalik</surname><given-names>M. M.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Минск</p></bio><bio xml:lang="en"><p>Minsk</p></bio><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Ковальчук</surname><given-names>Н. Г.</given-names></name><name name-style="western" xml:lang="en"><surname>Kovalchuk</surname><given-names>N. G.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Минск</p></bio><bio xml:lang="en"><p>Minsk</p></bio><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Нигериш</surname><given-names>К. А.</given-names></name><name name-style="western" xml:lang="en"><surname>Niherysh</surname><given-names>K. A.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Минск</p></bio><bio xml:lang="en"><p>Minsk</p></bio><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Фельшерук</surname><given-names>А. В.</given-names></name><name name-style="western" xml:lang="en"><surname>Felsharuk</surname><given-names>A. V.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Минск</p></bio><bio xml:lang="en"><p>Minsk</p></bio><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Прищепа</surname><given-names>С. Л.</given-names></name><name name-style="western" xml:lang="en"><surname>Prischepa</surname><given-names>S. L.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Минск;</p><p>Москва</p></bio><bio xml:lang="en"><p>Minsk;</p><p>Moscow</p></bio><xref ref-type="aff" rid="aff-2"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Комиссаров</surname><given-names>И. В.</given-names></name><name name-style="western" xml:lang="en"><surname>Komissarov</surname><given-names>I. V.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Минск</p></bio><bio xml:lang="en"><p>Minsk</p></bio><xref ref-type="aff" rid="aff-1"/></contrib></contrib-group><aff-alternatives id="aff-1"><aff xml:lang="ru"><institution>Белорусский государственный университет информатики и радиоэлектроники</institution></aff><aff xml:lang="en"><institution>Belarusian State University of Informatics and Radioelectronics</institution></aff></aff-alternatives><aff-alternatives id="aff-2"><aff xml:lang="ru"><institution>Белорусский государственный университет информатики и радиоэлектроники;&#13;
Национальный исследовательский ядерный университет “МИФИ”</institution></aff><aff xml:lang="en"><institution>Belarusian State University of Informatics and Radioelectronics;&#13;
National Research Nuclear University MEPHI</institution></aff></aff-alternatives><pub-date pub-type="collection"><year>2023</year></pub-date><pub-date pub-type="epub"><day>24</day><month>08</month><year>2023</year></pub-date><volume>90</volume><issue>4</issue><fpage>584</fpage><lpage>592</lpage><permissions><copyright-statement>Copyright &amp;#x00A9; Дронина Е.А., Михалик М.М., Ковальчук Н.Г., Нигериш К.А., Фельшерук А.В., Прищепа С.Л., Комиссаров И.В., 2023</copyright-statement><copyright-year>2023</copyright-year><copyright-holder xml:lang="ru">Дронина Е.А., Михалик М.М., Ковальчук Н.Г., Нигериш К.А., Фельшерук А.В., Прищепа С.Л., Комиссаров И.В.</copyright-holder><copyright-holder xml:lang="en">Dronina E.A., Mikhalik M.M., Kovalchuk N.G., Niherysh K.A., Felsharuk A.V., Prischepa S.L., Komissarov I.V.</copyright-holder><license xml:lang="ru" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>Данная работа распространяется под лицензией Creative Commons Attribution 4.0.</license-p></license><license xml:lang="en" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>This work is licensed under a Creative Commons Attribution 4.0 License.</license-p></license></permissions><self-uri xlink:href="https://zhps.ejournal.by/jour/article/view/1352">https://zhps.ejournal.by/jour/article/view/1352</self-uri><abstract><p>Проведены сравнительные исследования концентрации носителей заряда (n) и относительной деформации (e) в графене, синтезированном методом химического парофазного осаждения и перенесенном на поверхность подложки SiO2/Si с использованием двух различных каркасов — полиметилметакрилата (ПММА) и парафина — с последующей комплексной обработкой. Использован корреляционный метод анализа положений КР-активных мод. Установлено, что в случае использования парафина концентрация носителей заряда в графене меньше, чем для ПММА. Дальнейшая жидкофазная и термическая обработка, применяемая для удаления каркаса из парафина, приводит к росту n вплоть до 1.2 ∙ 1013 см–2. Для образцов графена, перенесенных с помощью каркаса из ПММА, тенденции в изменении n не наблюдается независимо от видов обработки. Разброс значений e для графена, перенесенного с помощью парафина с последующим применением жидкофазной и термической обработки в вакууме, больше, чем для графена, перенесенного с помощью ПММА и прошедшего аналогичную обработку: от –0.01875 до –0.1488 % и от –0.04375 до –0.0875 %. Установлено, что помимо непосредственно самого материала каркаса для переноса определяющее влияние на качество графена оказывает сочетание методов обработки. Оптимизация этих параметров позволяет повысить эффективность методики переноса графена с одновременным улучшением эксплуатационных характеристик устройств графеновой наноэлектроники.</p></abstract><trans-abstract xml:lang="en"><p>Comparative studies of charge carrier concentration (n) and relative strain (e) in graphene synthesized with chemical vapor deposition and transferred to the surface of SiO2/Si substrate using two different frames, polymethylmethacrylate (PMMA) and paraffin, followed by complex processing, were carried out. The correlation method for determining the positions of Raman active modes was implemented for the analysis. It was established that in the case of paraffin, the concentration of charge carriers in graphene was initially lower than for PMMA. Further liquid phase and heat treatment used to remove the paraffin frame led to an increase in n up to 1.2×1013 cm–2. For graphene samples transferred using a PMMA frame, no clear trend in the change in n was observed, regardless of the types of processing. At the same time, the spread of e values for graphene transferred with paraffin followed by liquid phase and heat treatment in vacuum was greater than for graphene transferred with PMMA and passed through a similar treatment, –0.01875 — –0.1488% and –0.04375 — –0.0875%, respectively. The results obtained during the study made it possible to establish that, in addition to the transfer frame material itself, a combination of processing methods had a decisive impact on the quality of graphene. Optimization of these parameters made it possible to increase the efficiency of the graphene transfer technique with a simultaneous improvement in the performance characteristics of graphene nanoelectronic devices.</p></trans-abstract><kwd-group xml:lang="ru"><kwd>графен</kwd><kwd>комбинационное рассеяние света</kwd><kwd>химическое парофазное осаждение</kwd><kwd>полиметилметакрилат</kwd><kwd>парафин</kwd><kwd>термическая обработка</kwd></kwd-group><kwd-group xml:lang="en"><kwd>graphene</kwd><kwd>Raman scattering</kwd><kwd>chemical vapor deposition</kwd><kwd>polymethylmethacrylate</kwd><kwd>paraffin</kwd><kwd>thermal treatment</kwd></kwd-group></article-meta></front><back><ref-list><title>References</title><ref id="cit1"><label>1</label><citation-alternatives><mixed-citation xml:lang="ru">S. Ullah, X. Yang, H. Q. Ta, M. Hasan, A. Bachmatiuk, K. Tokarska, B. Trzebicka, F.Lei, M. H. Rummeli. Nano Res., 14, N 11 (2021) 3756—3772</mixed-citation><mixed-citation xml:lang="en">S. Ullah, X. Yang, H. Q. Ta, M. Hasan, A. Bachmatiuk, K. Tokarska, B. Trzebicka, F.Lei, M. H. Rummeli. Nano Res., 14, N 11 (2021) 3756—3772</mixed-citation></citation-alternatives></ref><ref id="cit2"><label>2</label><citation-alternatives><mixed-citation xml:lang="ru">Y. Chen, X. L. Gong, J. G. Gai. Adv. Sci., 3, N 8 (2016) 1—15</mixed-citation><mixed-citation xml:lang="en">Y. Chen, X. L. Gong, J. G. Gai. Adv. Sci., 3, N 8 (2016) 1—15</mixed-citation></citation-alternatives></ref><ref id="cit3"><label>3</label><citation-alternatives><mixed-citation xml:lang="ru">X. L. Liang, B. A. Sperling, I. Calizo, G. J. Cheng, C. A. Hacker, Q. Zhang, Y. Obeng, K. Yan, H. L. Peng, Q. L. Li, X. X. Zhu, H. Yuan, A. R. H. Walker, Z. F. Liu, L. M. Peng, C. A. Richter. ACS Nano, 5, N 11 (2011) 9144—9153</mixed-citation><mixed-citation xml:lang="en">X. L. Liang, B. A. Sperling, I. Calizo, G. J. Cheng, C. A. Hacker, Q. Zhang, Y. Obeng, K. Yan, H. L. Peng, Q. L. Li, X. X. Zhu, H. Yuan, A. R. H. Walker, Z. F. Liu, L. M. Peng, C. A. Richter. ACS Nano, 5, N 11 (2011) 9144—9153</mixed-citation></citation-alternatives></ref><ref id="cit4"><label>4</label><citation-alternatives><mixed-citation xml:lang="ru">C. Gong, H. C. Floresca, D. Hinojos, S. McDonnell, X. Y. Qin, Y. F. Hao, S. Jandhyala, G. Mordi, J. Kim, L. Colombo, R. S. Ruoff, M. J. Kim, K. Cho, R. M. Wallace, Y. J. Chabal. J. Phys. Chem. C, 117, N 44 (2013) 23000—23008</mixed-citation><mixed-citation xml:lang="en">C. Gong, H. C. Floresca, D. Hinojos, S. McDonnell, X. Y. Qin, Y. F. Hao, S. Jandhyala, G. Mordi, J. Kim, L. Colombo, R. S. Ruoff, M. J. Kim, K. Cho, R. M. Wallace, Y. J. Chabal. J. Phys. Chem. C, 117, N 44 (2013) 23000—23008</mixed-citation></citation-alternatives></ref><ref id="cit5"><label>5</label><citation-alternatives><mixed-citation xml:lang="ru">Y. C. Lin, C. C. Lu, C. H. Yeh, C. Jin, K. Suenaga, P. W. Chiu. Nano Lett., 12, N 1 (2012) 414—419</mixed-citation><mixed-citation xml:lang="en">Y. C. Lin, C. C. Lu, C. H. Yeh, C. Jin, K. Suenaga, P. W. Chiu. Nano Lett., 12, N 1 (2012) 414—419</mixed-citation></citation-alternatives></ref><ref id="cit6"><label>6</label><citation-alternatives><mixed-citation xml:lang="ru">A. Suhail, K. Islam, B. Li, D. Jenkins, G. Pan. Appl. Phys. Lett., 110, N 18 (2017) 183103</mixed-citation><mixed-citation xml:lang="en">A. Suhail, K. Islam, B. Li, D. Jenkins, G. Pan. Appl. Phys. Lett., 110, N 18 (2017) 183103</mixed-citation></citation-alternatives></ref><ref id="cit7"><label>7</label><citation-alternatives><mixed-citation xml:lang="ru">H. J. Jeong, H. Y. Kim, S. Y. Jeong, J. T. Han, K. J. Baeg, J. Y. Hwang, G. W. Lee. Carbon, 66 (2014) 612—618</mixed-citation><mixed-citation xml:lang="en">H. J. Jeong, H. Y. Kim, S. Y. Jeong, J. T. Han, K. J. Baeg, J. Y. Hwang, G. W. Lee. Carbon, 66 (2014) 612—618</mixed-citation></citation-alternatives></ref><ref id="cit8"><label>8</label><citation-alternatives><mixed-citation xml:lang="ru">A. Pirkle, J. Chan, A. Venugopa, D. Hinojos, C. W. Magnuson, S. McDonnell1, L. Colombo, E. M. Vogel, R. S. Ruoff, R. M. Wallace. Appl. Phys. Lett., 99, N 12 (2011) 122108</mixed-citation><mixed-citation xml:lang="en">A. Pirkle, J. Chan, A. Venugopa, D. Hinojos, C. W. Magnuson, S. McDonnell1, L. Colombo, E. M. Vogel, R. S. Ruoff, R. M. Wallace. Appl. Phys. Lett., 99, N 12 (2011) 122108</mixed-citation></citation-alternatives></ref><ref id="cit9"><label>9</label><citation-alternatives><mixed-citation xml:lang="ru">W. S. Leong, H. Wang, J. Yeo, F. J. Martin-Martinez, A. Zubair, P. C. Shen, Y. Mao, T. Palacios, M. J. Buehler, J. Y. Hong, J. Kong. Nature Commun., 10, N 1 (2019) 1—8</mixed-citation><mixed-citation xml:lang="en">W. S. Leong, H. Wang, J. Yeo, F. J. Martin-Martinez, A. Zubair, P. C. Shen, Y. Mao, T. Palacios, M. J. Buehler, J. Y. Hong, J. Kong. Nature Commun., 10, N 1 (2019) 1—8</mixed-citation></citation-alternatives></ref><ref id="cit10"><label>10</label><citation-alternatives><mixed-citation xml:lang="ru">P. W. Qi, Y. N. Huang, Y. Z. Yao, Q. Li, Y. B. Lian, L. Lin, X. B. Wang, Y. D. Gu, L. Q. Li, Z. Deng, Y. Peng, Z. Liu. Appl. Surface Sci., 493 (2019) 81—86</mixed-citation><mixed-citation xml:lang="en">P. W. Qi, Y. N. Huang, Y. Z. Yao, Q. Li, Y. B. Lian, L. Lin, X. B. Wang, Y. D. Gu, L. Q. Li, Z. Deng, Y. Peng, Z. Liu. Appl. Surface Sci., 493 (2019) 81—86</mixed-citation></citation-alternatives></ref><ref id="cit11"><label>11</label><citation-alternatives><mixed-citation xml:lang="ru">E. Ó. Faoláin, M. B. Hunter, J. M. Byrne, P. Kelehan, H. A. Lambkin, H. J. Byrne, F. M. Lyng. J. Histochem. Cytochem., 53, N 1 (2005) 121—129</mixed-citation><mixed-citation xml:lang="en">E. Ó. Faoláin, M. B. Hunter, J. M. Byrne, P. Kelehan, H. A. Lambkin, H. J. Byrne, F. M. Lyng. J. Histochem. Cytochem., 53, N 1 (2005) 121—129</mixed-citation></citation-alternatives></ref><ref id="cit12"><label>12</label><citation-alternatives><mixed-citation xml:lang="ru">Qu, Jingyi, B. W. Li, Y. Shen, S. Huo, Y. Xu, S. Liu, B. Song, H. Wang, C. Hu, W. Feng. ACS Appl. Mater. Interfaces, 11, N 18 (2019) 16272—16279</mixed-citation><mixed-citation xml:lang="en">Qu, Jingyi, B. W. Li, Y. Shen, S. Huo, Y. Xu, S. Liu, B. Song, H. Wang, C. Hu, W. Feng. ACS Appl. Mater. Interfaces, 11, N 18 (2019) 16272—16279</mixed-citation></citation-alternatives></ref><ref id="cit13"><label>13</label><citation-alternatives><mixed-citation xml:lang="ru">B. Zhuang, S. Li, S. Li, J.Yin. Carbon, 173 (2021) 609—636</mixed-citation><mixed-citation xml:lang="en">B. Zhuang, S. Li, S. Li, J.Yin. Carbon, 173 (2021) 609—636</mixed-citation></citation-alternatives></ref><ref id="cit14"><label>14</label><citation-alternatives><mixed-citation xml:lang="ru">Н. Г. Ковальчук, К. А. Нигериш, М. М. Михалик, Н. И. Каргин, И. В. Комиссаров, С. Л. Прищепа. Журн. прикл. спектр., 84, № 6 (2018) 915—919 [N. G. Kovalchuk, K. A. Nigerish, M. M. Mikhalik, N. I. Kargin, I. V. Komissarov, S. L. Prischepa. J. Appl. Spectr., 84 (2018) 995—998]</mixed-citation><mixed-citation xml:lang="en">Н. Г. Ковальчук, К. А. Нигериш, М. М. Михалик, Н. И. Каргин, И. В. Комиссаров, С. Л. Прищепа. Журн. прикл. спектр., 84, № 6 (2018) 915—919 [N. G. Kovalchuk, K. A. Nigerish, M. M. Mikhalik, N. I. Kargin, I. V. Komissarov, S. L. Prischepa. J. Appl. Spectr., 84 (2018) 995—998]</mixed-citation></citation-alternatives></ref><ref id="cit15"><label>15</label><citation-alternatives><mixed-citation xml:lang="ru">K. A. Niherysh, J. Andzane, M. M. Mikhalik, S. M. Zavadsky, P. L. Dobrokhotov, F. Lombardi, S. L. Prischepa, I. V. Komissarov, D. Erts. Nanoscale Adv., 3, N 22 (2021) 6395—6402</mixed-citation><mixed-citation xml:lang="en">K. A. Niherysh, J. Andzane, M. M. Mikhalik, S. M. Zavadsky, P. L. Dobrokhotov, F. Lombardi, S. L. Prischepa, I. V. Komissarov, D. Erts. Nanoscale Adv., 3, N 22 (2021) 6395—6402</mixed-citation></citation-alternatives></ref><ref id="cit16"><label>16</label><citation-alternatives><mixed-citation xml:lang="ru">E. A. Kolesov, M. S. Tivanov, O. V. Korolik, E. Yu. Kataev, F. Xiao, O. O. Kapitanova, H. D. Cho, T. W. Kang, G. N. Panin. J. Phys. D: Appl. Phys., 53, N 4 (2019) 045302</mixed-citation><mixed-citation xml:lang="en">E. A. Kolesov, M. S. Tivanov, O. V. Korolik, E. Yu. Kataev, F. Xiao, O. O. Kapitanova, H. D. Cho, T. W. Kang, G. N. Panin. J. Phys. D: Appl. Phys., 53, N 4 (2019) 045302</mixed-citation></citation-alternatives></ref><ref id="cit17"><label>17</label><citation-alternatives><mixed-citation xml:lang="ru">J. Zabel, R. R. Nair, A. Ott, T. Georgiou, A. K. Geim, K. S. Novoselov, C. Casiraghi. Nano Lett., 12, N 2 (2012) 617—621</mixed-citation><mixed-citation xml:lang="en">J. Zabel, R. R. Nair, A. Ott, T. Georgiou, A. K. Geim, K. S. Novoselov, C. Casiraghi. Nano Lett., 12, N 2 (2012) 617—621</mixed-citation></citation-alternatives></ref><ref id="cit18"><label>18</label><citation-alternatives><mixed-citation xml:lang="ru">J. E. Lee, G. Ahn, J. Shim, Y. S. Lee, S. Ryu. Nature Commun., 3, N 1 (2012) 1—8</mixed-citation><mixed-citation xml:lang="en">J. E. Lee, G. Ahn, J. Shim, Y. S. Lee, S. Ryu. Nature Commun., 3, N 1 (2012) 1—8</mixed-citation></citation-alternatives></ref><ref id="cit19"><label>19</label><citation-alternatives><mixed-citation xml:lang="ru">B. S. Ryu, L. E. Brus, T. F. Heinz. Nano Lett., 9, N 1 (2009) 346—352</mixed-citation><mixed-citation xml:lang="en">B. S. Ryu, L. E. Brus, T. F. Heinz. Nano Lett., 9, N 1 (2009) 346—352</mixed-citation></citation-alternatives></ref><ref id="cit20"><label>20</label><citation-alternatives><mixed-citation xml:lang="ru">A. C. Ferrari, D. M. Basko. Nature Nanotechnol., 8, N 4 (2013) 235—246</mixed-citation><mixed-citation xml:lang="en">A. C. Ferrari, D. M. Basko. Nature Nanotechnol., 8, N 4 (2013) 235—246</mixed-citation></citation-alternatives></ref><ref id="cit21"><label>21</label><citation-alternatives><mixed-citation xml:lang="ru">S. Ryu, L. Liu, S. Berciaud, Y. J. Yu, H. Liu, P. Kim, G. W. Flynn, L. E. Brus. Nano Lett., 10, N 12 (2010) 4944—4951</mixed-citation><mixed-citation xml:lang="en">S. Ryu, L. Liu, S. Berciaud, Y. J. Yu, H. Liu, P. Kim, G. W. Flynn, L. E. Brus. Nano Lett., 10, N 12 (2010) 4944—4951</mixed-citation></citation-alternatives></ref></ref-list><fn-group><fn fn-type="conflict"><p>The authors declare that there are no conflicts of interest present.</p></fn></fn-group></back></article>
