<?xml version="1.0" encoding="UTF-8"?>
<!DOCTYPE article PUBLIC "-//NLM//DTD JATS (Z39.96) Journal Publishing DTD v1.3 20210610//EN" "JATS-journalpublishing1-3.dtd">
<article article-type="research-article" dtd-version="1.3" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xml:lang="ru"><front><journal-meta><journal-id journal-id-type="publisher-id">zhps</journal-id><journal-title-group><journal-title xml:lang="ru">Журнал прикладной спектроскопии</journal-title><trans-title-group xml:lang="en"><trans-title>Zhurnal Prikladnoii Spektroskopii</trans-title></trans-title-group></journal-title-group><issn pub-type="ppub">0514-7506</issn><publisher><publisher-name>B. I. Stepanov Institute of Physics of the National Academy of Sciences</publisher-name></publisher></journal-meta><article-meta><article-id custom-type="elpub" pub-id-type="custom">zhps-273</article-id><article-categories><subj-group subj-group-type="heading"><subject>Research Article</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="ru"><subject>***</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="en"><subject>***</subject></subj-group></article-categories><title-group><article-title>ВЛИЯНИЕ КОНЦЕНТРАЦИИ СЕРЫ НА ОПТИЧЕСКИЕ СВОЙСТВА ПЛЕНОК ZnS, СИНТЕЗИРОВАННЫХ НА ЗАТРАВОЧНОМ СЛОЕ ZnO МЕТОДОМ ОСАЖДЕНИЯ В ХИМИЧЕСКОЙ ВАННЕ</article-title><trans-title-group xml:lang="en"><trans-title>INFLUENCE OF SULFUR CONCENTRATIONS ON THE OPTICAL PROPERTIES OF ZnS FILMS ONTO ZnO SEED LAYER SYNTHESIZED BY CHEMICAL BATH DEPOSITION</trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Özütok</surname><given-names>F. .</given-names></name><name name-style="western" xml:lang="en"><surname>Özütok</surname><given-names>F. .</given-names></name></name-alternatives><email xlink:type="simple">fatmaozutok@comu.edu.tr</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Yakar</surname><given-names>E. .</given-names></name><name name-style="western" xml:lang="en"><surname>Yakar</surname><given-names>E. .</given-names></name></name-alternatives><email xlink:type="simple">noemail@neicon.ru</email><xref ref-type="aff" rid="aff-1"/></contrib></contrib-group><aff-alternatives id="aff-1"><aff xml:lang="ru"><institution>Университет Чанаккале Онсекиз Март</institution></aff><aff xml:lang="en"><institution>Çanakkale Onsekiz Mart University</institution></aff></aff-alternatives><pub-date pub-type="collection"><year>2018</year></pub-date><pub-date pub-type="epub"><day>10</day><month>03</month><year>2020</year></pub-date><volume>85</volume><issue>3</issue><elocation-id>519(1)-519(6)</elocation-id><permissions><copyright-statement>Copyright &amp;#x00A9; Özütok F..., Yakar E..., 2020</copyright-statement><copyright-year>2020</copyright-year><copyright-holder xml:lang="ru">Özütok F..., Yakar E...</copyright-holder><copyright-holder xml:lang="en">Özütok F..., Yakar E...</copyright-holder><license xml:lang="ru" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>Данная работа распространяется под лицензией Creative Commons Attribution 4.0.</license-p></license><license xml:lang="en" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>This work is licensed under a Creative Commons Attribution 4.0 License.</license-p></license></permissions><self-uri xlink:href="https://zhps.ejournal.by/jour/article/view/273">https://zhps.ejournal.by/jour/article/view/273</self-uri><abstract><p>Пленки ZnS синтезированы на затравочном слое ZnO осаждением химических растворов с концентрацией серы 6, 7 и 8 % с отжигом при 500 °С. Рабочие температуры затравочного слоя ZnO и пленок ZnS 50 ± 5 и 70 ± 5 ºC. Измерены структурные, оптические и морфологические характеристики этих пленок. Анализ методом энергодисперсионной рентгеновской спектроскопии показал, что пленки S:7 % имеют максимальное элементное отношение серы. Все пленки имеют преимущественную гексагональную [<xref ref-type="bibr" rid="cit110">110</xref>] ориентацию с различными полными ширинами на уровне половинной амплитуды. Наиболее очевидные наноразмерные образования наблюдались в пленках S:7 %. Пленки S:6 % имеют более высокую оптическую прозрачность (&gt;65 % в видимой области). Анализ спектра фотолюминесценции показал, что с включением серы интенсивности широкой синей и узкой зеленой полос излучения изменяются. </p></abstract><trans-abstract xml:lang="en"><p>ZnS films were synthesized onto ZnO seed layer by chemical bath deposition (CBD) and annealing at 500ºC. To prepare films, molar percentages of sulfur were chosen as 6, 7, and 8%. Working temperatures of ZnO seed layer and ZnS films were 50 ± 5 and 70 ± 5ºC, respectively. Differences in structural, optical, and morphological properties were measure on those films. EDX analysis shows that S:7% films had the maximum elemental sulfur ratio. All films have ZnS (hexzagonal) [<xref ref-type="bibr" rid="cit110">110</xref>] preferential orientation with different FWHMs. The most obvious nanorod formations were observed in S:7% films. Additionally, S:6% films had higher optical transparency over 65% in the visible region. Photoluminescence spectrum showed that the broad blue and narrow green emission and intensity were changed upon sulfur inclusion. </p></trans-abstract><kwd-group xml:lang="ru"><kwd>пленки ZnS</kwd><kwd>затравочный слой ZnO</kwd><kwd>осаждение химических растворов</kwd><kwd>фотолюминесценция</kwd><kwd>ультрафиолетовая спектроскопия</kwd><kwd>ZnS films</kwd><kwd>ZnO seed layer</kwd><kwd>chemical bath deposition</kwd><kwd>photoluminescence</kwd><kwd>UV-Vis spectroscopy</kwd></kwd-group></article-meta></front><back><ref-list><title>References</title><ref id="cit1"><label>1</label><citation-alternatives><mixed-citation xml:lang="ru">C. H. Frijters, P. Poodt, A. Illiberi, Solar Energy Mater. Solar Cells, 15, 356-361 (2016).</mixed-citation><mixed-citation xml:lang="en">C. H. Frijters, P. Poodt, A. Illiberi, Solar Energy Mater. Solar Cells, 15, 356-361 (2016).</mixed-citation></citation-alternatives></ref><ref id="cit2"><label>2</label><citation-alternatives><mixed-citation xml:lang="ru">Ü. Özgür, D. Hofstetter, H. Morkoc, IEEE 98, 7, 1180-1196 (2010).</mixed-citation><mixed-citation xml:lang="en">Ü. Özgür, D. Hofstetter, H. Morkoc, IEEE 98, 7, 1180-1196 (2010).</mixed-citation></citation-alternatives></ref><ref id="cit3"><label>3</label><citation-alternatives><mixed-citation xml:lang="ru">K. Seomoon, J. Lee, P. Jang, C. Jung, K. Kim, Curr. Appl. Phys., 11, 522-526 (2011).</mixed-citation><mixed-citation xml:lang="en">K. Seomoon, J. Lee, P. Jang, C. Jung, K. Kim, Curr. Appl. Phys., 11, 522-526 (2011).</mixed-citation></citation-alternatives></ref><ref id="cit4"><label>4</label><citation-alternatives><mixed-citation xml:lang="ru">N. Magayasamy, S. Gandhimathination, V. Veerasamy, Open J. Metal, 3 (2013).</mixed-citation><mixed-citation xml:lang="en">N. Magayasamy, S. Gandhimathination, V. Veerasamy, Open J. Metal, 3 (2013).</mixed-citation></citation-alternatives></ref><ref id="cit5"><label>5</label><citation-alternatives><mixed-citation xml:lang="ru">E. Pourshaban, H. Abdizadeha, M. R. Golobostanfard, Proc. Mater. Sci., 11, 352-358 (2015).</mixed-citation><mixed-citation xml:lang="en">E. Pourshaban, H. Abdizadeha, M. R. Golobostanfard, Proc. Mater. Sci., 11, 352-358 (2015).</mixed-citation></citation-alternatives></ref><ref id="cit6"><label>6</label><citation-alternatives><mixed-citation xml:lang="ru">J. Song, S. Lim, J. Phys. Chem. C, 111, 596-600 (2007).</mixed-citation><mixed-citation xml:lang="en">J. Song, S. Lim, J. Phys. Chem. C, 111, 596-600 (2007).</mixed-citation></citation-alternatives></ref><ref id="cit7"><label>7</label><citation-alternatives><mixed-citation xml:lang="ru">519-6 Z. Alaie, S. M. Nejad, M. H.Yousefi, S. Safarzadeh, Int. J. Nanosci. Nanotechnol., 12, 119-125 (2016).</mixed-citation><mixed-citation xml:lang="en">519-6 Z. Alaie, S. M. Nejad, M. H.Yousefi, S. Safarzadeh, Int. J. Nanosci. Nanotechnol., 12, 119-125 (2016).</mixed-citation></citation-alternatives></ref><ref id="cit8"><label>8</label><citation-alternatives><mixed-citation xml:lang="ru">F. Özütok, S. Demiri, Digest J. Nanomater. Biostruct., 12, 309-317 (2017).</mixed-citation><mixed-citation xml:lang="en">F. Özütok, S. Demiri, Digest J. Nanomater. Biostruct., 12, 309-317 (2017).</mixed-citation></citation-alternatives></ref><ref id="cit9"><label>9</label><citation-alternatives><mixed-citation xml:lang="ru">Z. Yang, W. Zhong, Y. Deng, C. Au, Y. Du, Nanoscale Res. Lett., 5, 1124-1127 (2010).</mixed-citation><mixed-citation xml:lang="en">Z. Yang, W. Zhong, Y. Deng, C. Au, Y. Du, Nanoscale Res. Lett., 5, 1124-1127 (2010).</mixed-citation></citation-alternatives></ref><ref id="cit10"><label>10</label><citation-alternatives><mixed-citation xml:lang="ru">L. Zhu, P. Chen, Y. Guo, Y. Song, X. Xue, X. Cao, Colloids and Surfaces A: Physicochem. Eng. Aspects, 360, 111-119 (2010).</mixed-citation><mixed-citation xml:lang="en">L. Zhu, P. Chen, Y. Guo, Y. Song, X. Xue, X. Cao, Colloids and Surfaces A: Physicochem. Eng. Aspects, 360, 111-119 (2010).</mixed-citation></citation-alternatives></ref><ref id="cit11"><label>11</label><citation-alternatives><mixed-citation xml:lang="ru">R. R. Thankalekshmi, A.C. Rastogi, J. Appl. Phys., 112, 063708-063718 (2016).</mixed-citation><mixed-citation xml:lang="en">R. R. Thankalekshmi, A.C. Rastogi, J. Appl. Phys., 112, 063708-063718 (2016).</mixed-citation></citation-alternatives></ref><ref id="cit12"><label>12</label><citation-alternatives><mixed-citation xml:lang="ru">N. K. Allouche, T. B. Nasr, N. T. Kamouna, C. Guasch, Mater. Chem. Phys., 123, 620-624 (2010).</mixed-citation><mixed-citation xml:lang="en">N. K. Allouche, T. B. Nasr, N. T. Kamouna, C. Guasch, Mater. Chem. Phys., 123, 620-624 (2010).</mixed-citation></citation-alternatives></ref><ref id="cit13"><label>13</label><citation-alternatives><mixed-citation xml:lang="ru">P. Hu, G. Gong, F. Zhan, Y. Zhang, R. Li, Y. Cao, Dalton Trans., 45, 2409-2416 (2016).</mixed-citation><mixed-citation xml:lang="en">P. Hu, G. Gong, F. Zhan, Y. Zhang, R. Li, Y. Cao, Dalton Trans., 45, 2409-2416 (2016).</mixed-citation></citation-alternatives></ref><ref id="cit14"><label>14</label><citation-alternatives><mixed-citation xml:lang="ru">K. Kim, K. Utashiro, Y. Abe, M. Kawamura, Int. J. Electrochem. Sci., 9, 2080-2089 (2014).</mixed-citation><mixed-citation xml:lang="en">K. Kim, K. Utashiro, Y. Abe, M. Kawamura, Int. J. Electrochem. Sci., 9, 2080-2089 (2014).</mixed-citation></citation-alternatives></ref><ref id="cit15"><label>15</label><citation-alternatives><mixed-citation xml:lang="ru">L. Lin, Y. Qiu, Y. Zhang, H. Zhang, Chin. Phys. Soc., 33, 107801-107805 (2016).</mixed-citation><mixed-citation xml:lang="en">L. Lin, Y. Qiu, Y. Zhang, H. Zhang, Chin. Phys. Soc., 33, 107801-107805 (2016).</mixed-citation></citation-alternatives></ref><ref id="cit16"><label>16</label><citation-alternatives><mixed-citation xml:lang="ru">S. Golmohammadi, Y. Rouhani, K. Abbasian, A. Rostami, Progres. Electromagn. Res. B, 18, 311-325 (2009).</mixed-citation><mixed-citation xml:lang="en">S. Golmohammadi, Y. Rouhani, K. Abbasian, A. Rostami, Progres. Electromagn. Res. B, 18, 311-325 (2009).</mixed-citation></citation-alternatives></ref><ref id="cit17"><label>17</label><citation-alternatives><mixed-citation xml:lang="ru">D. Kurbatov, A.Оpanasyuk, S. Kshnyakına, V. Мelnik, V. Nesprava, Rom. J. Phys., 55, 213-219 (2008).</mixed-citation><mixed-citation xml:lang="en">D. Kurbatov, A.Оpanasyuk, S. Kshnyakına, V. Мelnik, V. Nesprava, Rom. J. Phys., 55, 213-219 (2008).</mixed-citation></citation-alternatives></ref><ref id="cit18"><label>18</label><citation-alternatives><mixed-citation xml:lang="ru">C. Persson, Phys. Rev. Lett., 97, 146403-146407 (2006).</mixed-citation><mixed-citation xml:lang="en">C. Persson, Phys. Rev. Lett., 97, 146403-146407 (2006).</mixed-citation></citation-alternatives></ref><ref id="cit19"><label>19</label><citation-alternatives><mixed-citation xml:lang="ru">B. D. Viezbicke, S. Patel, B. E. Davis, D. P. Birnie, Phys. Status Solidi B, 252 1700-1710 (2015).</mixed-citation><mixed-citation xml:lang="en">B. D. Viezbicke, S. Patel, B. E. Davis, D. P. Birnie, Phys. Status Solidi B, 252 1700-1710 (2015).</mixed-citation></citation-alternatives></ref><ref id="cit20"><label>20</label><citation-alternatives><mixed-citation xml:lang="ru">M. Jaquez, K. M. Yu, M. Ting, M. Hettick, J. F. Sanchez-Royo, M. Wełna, M. Javey, O. D. Dubon, W. Walukiewicz, J. Appl. Phys., 118, 215702-215709 (2015).</mixed-citation><mixed-citation xml:lang="en">M. Jaquez, K. M. Yu, M. Ting, M. Hettick, J. F. Sanchez-Royo, M. Wełna, M. Javey, O. D. Dubon, W. Walukiewicz, J. Appl. Phys., 118, 215702-215709 (2015).</mixed-citation></citation-alternatives></ref><ref id="cit21"><label>21</label><citation-alternatives><mixed-citation xml:lang="ru">N. Roy, A. Roy, J. Mater. Sci: Mater. Electron., 25, 1275-1279 (2014).</mixed-citation><mixed-citation xml:lang="en">N. Roy, A. Roy, J. Mater. Sci: Mater. Electron., 25, 1275-1279 (2014).</mixed-citation></citation-alternatives></ref><ref id="cit22"><label>22</label><citation-alternatives><mixed-citation xml:lang="ru">X. Wang, S. Liu, P. Chang, Y. Tang, Chin. J. Chem. Phys., 20, 632-636 (2007).</mixed-citation><mixed-citation xml:lang="en">X. Wang, S. Liu, P. Chang, Y. Tang, Chin. J. Chem. Phys., 20, 632-636 (2007).</mixed-citation></citation-alternatives></ref><ref id="cit23"><label>23</label><citation-alternatives><mixed-citation xml:lang="ru">Z. Chen, X.X. Li, D. Guoping, Q. Yu, B. Li, X. Huang, Ceram. Int., 40, 13151-13157 (2014).</mixed-citation><mixed-citation xml:lang="en">Z. Chen, X.X. Li, D. Guoping, Q. Yu, B. Li, X. Huang, Ceram. Int., 40, 13151-13157 (2014).</mixed-citation></citation-alternatives></ref><ref id="cit24"><label>24</label><citation-alternatives><mixed-citation xml:lang="ru">R. Jayakrishnan, K. Mohanachandran, R. Sreekumar, C. S. Kartha, K. P. Vijayakumar, Mater. Sci. Semiconduct. Proc., 16, 326-331 (2013).</mixed-citation><mixed-citation xml:lang="en">R. Jayakrishnan, K. Mohanachandran, R. Sreekumar, C. S. Kartha, K. P. Vijayakumar, Mater. Sci. Semiconduct. Proc., 16, 326-331 (2013).</mixed-citation></citation-alternatives></ref><ref id="cit25"><label>25</label><citation-alternatives><mixed-citation xml:lang="ru">D. A. Reddy, D. H. Kim, S. J. Rhee, B. W. Lee, C. Liu, Nanoscale Res. Lett., 9, 20-28 (2014).</mixed-citation><mixed-citation xml:lang="en">D. A. Reddy, D. H. Kim, S. J. Rhee, B. W. Lee, C. Liu, Nanoscale Res. Lett., 9, 20-28 (2014).</mixed-citation></citation-alternatives></ref></ref-list><fn-group><fn fn-type="conflict"><p>The authors declare that there are no conflicts of interest present.</p></fn></fn-group></back></article>
