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Creation of an Optical Profile Diffraction Grating Based on Nanoporous Germanium by Sputtering with Bismuth Ions
Abstract
A method is proposed for creating an optical profile diffraction grating based on nanoporous Ge layers by sputtering a single-crystal c-Ge substrate by Bi+ ions at an energy of E = 18 keV, an ion beam current density of J = 5 μA/cm2, and a dose range of D = 2.5 × 1016—1.0 × 1017 ion/cm2 through a copper mesh mask with a square cell size of 20 μm. During ion irradiation, c-Ge is sputtered in unmasked areas of the irradiated c-Ge, and a nanoporous Bi:PGe layer is formed. The formation of periodic Bi:PGe microstructures on the c-Ge surface was monitored using optical, electron, and probe microscopy. The operation of the diffraction grating was demonstrated by probing it with helium-neon laser radiation at a wavelength of 632.8 nm in the optical spectral range.
About the Authors
A. L Stepanov
Zavoisky Physical-Technical Institute, FRC Kazan Scientific Center of RAS
Russian Federation
Russian Federation
Kazan
A. M. Rogov
Zavoisky Physical-Technical Institute, FRC Kazan Scientific Center of RAS
Russian Federation
Russian Federation
Kazan
V. F. Sotnikova
Zavoisky Physical-Technical Institute, FRC Kazan Scientific Center of RAS
Russian Federation
Russian Federation
Kazan
V. F. Valeev
Zavoisky Physical-Technical Institute, FRC Kazan Scientific Center of RAS
Russian Federation
Russian Federation
Kazan
V. I. Nuzhdin
Zavoisky Physical-Technical Institute, FRC Kazan Scientific Center of RAS
Russian Federation
Russian Federation
Kazan
D. A. Konovalov
Zavoisky Physical-Technical Institute, FRC Kazan Scientific Center of RAS
Russian Federation
Russian Federation
Kazan
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Review
For citations:
Stepanov A.L., Rogov A.M., Sotnikova V.F., Valeev V.F., Nuzhdin V.I., Konovalov D.A. Creation of an Optical Profile Diffraction Grating Based on Nanoporous Germanium by Sputtering with Bismuth Ions. Zhurnal Prikladnoii Spektroskopii. 2026;93(1):128-132. (In Russ.)
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