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Microstructure and Properties of Thin Zirconium Films Produced by High-Frequency Laser Deposition

Abstract

By the method of high-frequency repetitively pulsed f ~ 6—10 kHz laser radiation with wavelength l = 1.064 μm and power density q = 120 MW/cm2 on zirconium target at a pressure in the vacuum chamber p = 2.2 Pa nanostructured thin films on a silicon substrate have been obtained. The morphology of thin zirconium films has been studied using atomic force microscopy. Transmission spectra of zirconium films have been obtained in the visible, near and mid-IR regions. The electrophysical characteristics of Zr/Si structures are analyzed.

About the Authors

N. A. Bosak
B. I. Stepanov Institute of Physics of the National Academy of Sciences of Belarus
Belarus

Minsk



A. N. Chumakov
B. I. Stepanov Institute of Physics of the National Academy of Sciences of Belarus
Belarus

Minsk



L. V. Baran
Belarusian State University
Belarus

Minsk



V. V. Malyutina-Bronskaya
SSPA “Optics, Optoelectronics, and Laser Technology
Belarus

Minsk



M. Ivkovich
Institute of Physics
Serbia

Belgrade



N. Sakan
Institute of Physics
Serbia

Belgrade



A. A. Ivanov
B. I. Stepanov Institute of Physics of the National Academy of Sciences of Belarus
Belarus

Minsk



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Review

For citations:


Bosak N.A., Chumakov A.N., Baran L.V., Malyutina-Bronskaya V.V., Ivkovich M., Sakan N., Ivanov A.A. Microstructure and Properties of Thin Zirconium Films Produced by High-Frequency Laser Deposition. Zhurnal Prikladnoii Spektroskopii. 2023;90(6):877-881. (In Russ.)

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ISSN 0514-7506 (Print)