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Morphology and Optical Characteristics of TiO2 Nanofilms Grown by Atomic Layer Deposition on a Macroporous Silicon Substrate
Abstract
The process of creating a macroporous silicon substrate on which a layer of titanium dioxide is deposited using the atomic layer deposition method is described. To form a macroporous structure of the substrate, the method of electrochemical etching was used. TiO2 deposition was carried out using the SI PEALD setup. The morphology, structure and optical properties of the deposited TiO2 film were assessed using scanning electron microscopy coupled with energy dispersive X-ray spectroscopy, spectral ellipsometry in the range of 240–1000 nm and Raman spectroscopy. The Raman spectra revealed peaks at 144, 194, 397, 639 cm–1, which is the characteristic of one of the modifications of TiO2 – anatase. Based on the calculated ellipsometric parameters, the absorption coefficient and the optical band gap of the deposited film were determined.
About the Authors
T. K. Turdaliev
U. A. Arifov Institute of Ion Plasma and Laser Technologies, Academy of Sciences of the Republic of Uzbekistan
Uzbekistan
Uzbekistan
Tashkent
K. B. Ashurov
U. A. Arifov Institute of Ion Plasma and Laser Technologies, Academy of Sciences of the Republic of Uzbekistan
Uzbekistan
Uzbekistan
Tashkent
R. K. Ashurov
U. A. Arifov Institute of Ion Plasma and Laser Technologies, Academy of Sciences of the Republic of Uzbekistan
Uzbekistan
Uzbekistan
Tashkent
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Review
For citations:
Turdaliev T.K., Ashurov K.B., Ashurov R.K. Morphology and Optical Characteristics of TiO2 Nanofilms Grown by Atomic Layer Deposition on a Macroporous Silicon Substrate. Zhurnal Prikladnoii Spektroskopii. 2024;91(4):534-539. (In Russ.)
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