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Surface Morphology, Optical, and Electrophysical Properties of Nb2O5 Films
Abstract
The results of complex studies of thin Nb2O5 films were presented. Thin Nb2O5 films were deposited in vacuum (p = 2.2 Pa) on quartz and silicon substrates under multi-pulse high-frequency (f ~ 10–12 kHz) laser action on a ceramic target at laser power density of q = 81 MW/cm2. The morphology of the obtained films was studied using atomic force microscopy, the features of the transmission spectra were presented. The analysis of photoelectrical properties of Nb2O5/Si structure was carried out.
About the Authors
N. A. Bosak
B.I. Stepanov Institute of Physics of the National Academy of Sciences of Belarus
Belarus
Belarus
Minsk
P. V. Shpak
B.I. Stepanov Institute of Physics of the National Academy of Sciences of Belarus
Belarus
Belarus
Minsk
A. N. Chumakov
B.I. Stepanov Institute of Physics of the National Academy of Sciences of Belarus
Belarus
Belarus
Minsk
L. V. Baran
Belarusian State University
Belarus
Belarus
Minsk
V. V. Malutina-Bronskaya
SSPA “Optics, Optoelectronics, and Lazer Technology”
Belarus
Belarus
Minsk
V. S. Drobush
B.I. Stepanov Institute of Physics of the National Academy of Sciences of Belarus
Belarus
Belarus
Minsk
A. S. Kuzmitskaya
SSPA “Optics, Optoelectronics, and Lazer Technology”
Belarus
Belarus
Minsk
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Review
For citations:
Bosak N.A., Shpak P.V., Chumakov A.N., Baran L.V., Malutina-Bronskaya V.V., Drobush V.S., Kuzmitskaya A.S. Surface Morphology, Optical, and Electrophysical Properties of Nb2O5 Films. Zhurnal Prikladnoii Spektroskopii. 2025;92(4):462-468. (In Russ.)
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