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Zhurnal Prikladnoii Spektroskopii

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For citations:

Abramov A.V., Pankratova E.A., Surovtsev I.S. INTERFERENCE OF THE LUMINESCENT GLOW OF SILICON DIOXIDE DURING REACTIVE ION-PLASMA ETCHING. Zhurnal Prikladnoii Spektroskopii. 2020;87(2):189-193. (In Russ.)

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ISSN 0514-7506 (Print)
68-2 Nezavisimosti Prosp., Minsk 220072, Belarus
B. I. Stepanov Institute of Physics of the National Academy of Sciences
Telephone/Fax: (37517) 2708457
e-mail: jas@ifanbel.bas-net.by
supported by NEICON (Elpub lab)