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Zhurnal Prikladnoii Spektroskopii

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For citations:

Bazarov V.V., Nuzhdin V.I., Valeev V.F., Lyadov N.M. SPECTROSCOPIC ELLIPSOMETRY STUDY OF SILICON SURFACE IMPLANTED BY THE OXYGEN AND HELIUM IONS. Zhurnal Prikladnoii Spektroskopii. 2019;86(1):151-154. (In Russ.)

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ISSN 0514-7506 (Print)
68-2 Nezavisimosti Prosp., Minsk 220072, Belarus
B. I. Stepanov Institute of Physics of the National Academy of Sciences
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supported by NEICON (Elpub lab)